Crystal structure dependence of antiferromagnetic coupling in Fe/Si multilayers
Recent reports of temperature dependent antiferromagnetic coupling in Fe/Si multilayers have motivated the generalization of models describing magnetic coupling in metal/metal multilayers to metal/insulator and metal/semiconductor layered systems. Interesting dependence of the magnetic properties on layer thickness and temperature are predicted. We report measurements that show the antiferromagnetic (AF) coupling observed in Fe/Si multilayers is strongly dependent on the crystalline coherence of the silicide interlayer. Electron diffraction images show the silicide interlayer has a CsCl structure. It is not clear at this time whether the interlayer is a poor metallic conductor or a semiconductor so the relevance of generalized coupling theories is unclear.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 93606
- Report Number(s):
- UCRL-JC--120161; CONF-950412--36; ON: DE95015888
- Country of Publication:
- United States
- Language:
- English
Similar Records
Structure and magnetism of Fe/Si multilayers grown by ion-beam sputtering
Soft-x-ray fluorescence study of buried silicides in antiferromagnetically coupled Fe/Si multilayers