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Title: Anomalous temperature dependence of interlayer coupling in Fe/Si multilayers (abstract)

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.361861· OSTI ID:280011
; ;  [1];  [2]; ;  [3]
  1. Lawrence Livermore National Laboratory, Livermore, California 94550 (United States)
  2. National Institute of Standards and Technology, Boulder, Colorado 80303 (United States)
  3. University of Missouri-Columbia, Columbia, Missouri 65211 (United States)

The magnetic coupling of the Fe layers in Fe/Si multilayers strongly depends on the morphology of the iron-silicide interlayer that forms during deposition. Antiferromagnetic interlayer coupling is only observed in Fe/Si multilayers with crystalline interlayers in the CsCl structure. Recently, it has been shown that single layers of Fe{endash}Si in the CsCl structure can be grown epitaxially on Si over a range of stoichiometries. FeSi films are reported to be Kondo insulators below 50 K. We find evidence of a magnetic phase transition in antiferromagnetically coupled Fe/Si multilayers. {ital M}{sub {ital s}} measured in a constant applied field of 50 kOe shows {ital T}{sup 3/2} behavior down to 10 K. However, {ital M}({ital T}) at a lower constant field peaks around 50 K and decreases at lower temperature, indicating enhanced antiferromagnetic coupling or a phase transition. The remanent magnetization increases monotonically with decreasing temperature and has been explained by invoking thermally activated coupling. However, the saturation field also increases with decreasing temperature, indicating a stronger antiferromagnetic interaction. We explore the suggestion that the interlayer coupling is biquadratic in nature. Polarized neutron reflectometry has also been used to get a clearer picture of the complicated magnetic behavior of this multilayer system. {copyright} {ital 1996 American Institute of Physics.}

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
280011
Report Number(s):
CONF-951101-; ISSN 0021-8979; TRN: 9608M0062
Journal Information:
Journal of Applied Physics, Vol. 79, Issue 8; Conference: 40. conference on magnetism and magnetic materials, Philadelphia, PA (United States), 6-9 Nov 1995; Other Information: PBD: Apr 1996
Country of Publication:
United States
Language:
English

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