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Title: YBa2Cu3O7-δ Formation by Processing of Laser-Ablated, Fluorine-Free Precursor Films

Conference ·
OSTI ID:931695

Epitaxial YBa{sub 2}Cu{sub 3}O{sub 7-{delta}} was formed by processing of laser-ablated, fluorine-free precursor films. The depositions were conducted at room temperature in low oxygen pressure on LaAlO{sub 3}(LAO) single crystal substrates. Processing was done in the same deposition chamber by heating the precursor film to reaction temperatures of 750-850degC in a reducing gas ambient, and then raising the oxygen pressure to the conversion point. Typical processing times are a few minutes, corresponding to minimum YBCO growth rates of 1 nm/s. XRD analysis shows epitaxial growth and high crystallinity, although measured {Tc} values are somewhat suppressed at 88 K, with resulting critical current density, J{sub c} of about 1 MA/cm2 at 77 K, as determined by magnetic hysteresis. Properties indicate that the materials lack appropriate level of defects needed both for rapid oxygenation and flux pinning.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
OE USDOE - Office of Electric Transmission and Distribution
DOE Contract Number:
DE-AC05-00OR22725
OSTI ID:
931695
Resource Relation:
Conference: Applied Superconductor Conference, Seattle, WA, USA, 20060827, 20060901
Country of Publication:
United States
Language:
English