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Solid-State Formation of Titanium Carbide and Molybdenum Carbide as Contcts for Carbon-Containing Semiconductors

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.2180436· OSTI ID:930564
Metal carbides are good candidates to contact carbon-based semiconductors (SiC, diamond, and carbon nanotubes). Here, we report on an in situ study of carbide formation during the solid-state reaction between thin Ti or Mo films and C substrates. Titanium carbide (TiC) was previously reported as a contact material to diamond and carbon nanotubes. However, the present study shows two disadvantages for the solid-state reaction of Ti and C. First, because Ti reacts readily with oxygen, a capping layer should be included to enable carbide formation. Second, the TiC phase can exist over a wide range of composition (about 10%, i.e., from Ti{sub 0.5}C{sub 0.5} to Ti{sub 0.6}C{sub 0.4}), leading to significant variations in the properties of the material formed. The study of the Mo-C system suggests that molybdenum carbide (Mo{sub 2}C) is a promising alternative, since the phase shows a lower resistivity (about 45% lower than for TiC), the carbide forms below 900 {sup o}C, and its formation is less sensitive to oxidation as compared with the Ti-C system. The measured resistivity for Mo{sub 2}C is p=59 {mu}{Omega} cm, and from kinetic studies an activation energy for Mo{sub 2}C formation of E{sub a}=3.15+/-0.15 eV was obtained.
Research Organization:
Brookhaven National Laboratory (BNL) National Synchrotron Light Source
Sponsoring Organization:
Doe - Office Of Science
DOE Contract Number:
AC02-98CH10886
OSTI ID:
930564
Report Number(s):
BNL--80723-2008-JA
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 6 Vol. 99; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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