Investigation of heteroepitaxial growth of magnetite thin films.

Conference · Sun Jul 01 00:00:00 EDT 2007 · J. Vac. Sci. Technol. B

DOI:https://doi.org/10.1116/1.2757185· OSTI ID:929233

Sterbinsky, G E; Cheng, J; Chiu, P T; Wessels, B W; Keavney, D J

Epitaxial magnetite (Fe{sub 3}O{sub 4}) thin films were deposited by molecular beam epitaxy using molecular oxygen as the oxidant. Films deposited on (001) SrTiO{sub 3}, (001) MgO, and (001) BaTiO{sub 3} surfaces are epitaxial with the film (001) parallel to the substrate (001) and the film <100> parallel to the substrate <100>. X-ray magnetic circular dichroism was used to determine the relative Fe{sup 2+}/Fe{sup 3+} stoichiometry of the magnetite films, which was nearly independent of oxygen partial pressure over the range studied. All films show no in-plane magnetic anisotropy. Coercive fields ranged from 0.019 to 0.039 T and depended on film roughness.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC); National Science Foundation (NSF)
• DOE Contract Number: DE-AC02-06CH11357
• OSTI ID: 929233
• Report Number(s): ANL/XSD/CP-57961; TRN: US200815%%242
• Journal Information: J. Vac. Sci. Technol. B, Vol. 25, Issue 4 ; Jul./Aug. 2007; Conference: North American Molecular Beam Epitaxy; Oct 8-11, 2006; Durham, NC
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
MAGNETIC CIRCULAR DICHROISM
MAGNETITE
MOLECULAR BEAM EPITAXY
OXYGEN
PARTIAL PRESSURE
ROUGHNESS
STOICHIOMETRY
SUBSTRATES
THIN FILMS