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In-situ X-ray photoelectron spectroscopy studies of water on metals and oxides at ambient conditions

Journal Article · · Journal of Physics: Condensed Matter
OSTI ID:927886
X-ray photoelectron spectroscopy (XPS) is a powerful tool for surface and interface analysis, providing the elemental composition of surfaces and the local chemical environment of adsorbed species. Conventional XPS experiments have been limited to ultrahigh vacuum (UHV) conditions due to a short mean free path of electrons in a gas phase. The recent advances in instrumentation coupled with third-generation synchrotron radiation sources enables in-situ XPS measurements at pressures above 5 Torr. In this review, we describe the basic design of the ambient pressure XPS setup that combines differential pumping with an electrostatic focusing. We present examples of the application of in-situ XPS to studies of water adsorption on the surface of metals and oxides including Cu(110), Cu(111), TiO2(110) under environmental conditions of water vapor pressure. On all these surfaces we observe a general trend where hydroxyl groups form first, followed by molecular water adsorption. The importance of surface OH groups and their hydrogen bonding to water molecules in water adsorption on surfaces is discussed in detail.
Research Organization:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
Sponsoring Organization:
Materials Sciences Division
DOE Contract Number:
AC02-05CH11231
OSTI ID:
927886
Report Number(s):
LBNL-205E
Journal Information:
Journal of Physics: Condensed Matter, Journal Name: Journal of Physics: Condensed Matter Vol. 20
Country of Publication:
United States
Language:
English

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