Chemical and magnetic interface properties of tunnel junctionswith co2mnsi/co2fesi multilayer electrode showing large tunnelingmagnetoresistance
Conference
·
OSTI ID:927323
Transport, as well as chemical and magnetic interface properties of two kinds of magnetic tunnel junctions (MTJs) with Co{sub 2}FeSi electrode, Al-O barrier, and Co-Fe counter electrode, are investigated. For junctions with Co{sub 2}FeSi single-layer electrodes, a tunnel magnetoresistance of up to 52% is found after optimal annealing for an optimal Al thickness of 1.5 nm, whereas the room temperature bulk magnetization of the Co{sub 2}FeSi film reaches only 75% of the expected value. By using a [Co{sub 2}MnSi/Co{sub 2}FeSi]{sub x10} multilayer electrode, the magnetoresistance can be increased to 114%, corresponding to a large spin polarization of 0.74, and the full bulk magnetization is reached. For Al thickness smaller than 1 nm, the TMR of both kinds of MTJs decreases rapidly to zero. On the other hand, for 2- to 3-nm-thick Al, the TMR decreases only slowly. The Al thickness dependence of the TMR is directly correlated to the element-specific magnetic moments of Fe and Co at the Co{sub 2}FeSi/Al-O interface for all Al thickness. Especially, for optimal Al thickness and annealing, the interfacial Fe moment of the single-layer electrode is about 20% smaller than for the multilayer electrode, indicating smaller atomic disorder at the barrier interface for the latter MTJ.
- Research Organization:
- COLLABORATION - Department of Physics,Bielefeld University,D- 33501 Bielefeld, Germany
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 927323
- Report Number(s):
- LBNL--62705
- Country of Publication:
- United States
- Language:
- English
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