Nitride mediated epitaxy of CoSi2 on Si(100)
Journal Article
·
· Applied Physics Letters
OSTI ID:917286
No abstract prepared.
- Research Organization:
- COLLABORATION - Natl. U. ofSingapore
- Sponsoring Organization:
- USDOE Director, Office of Science. Office of Basic EnergySciences. Materials Science and Engineering Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 917286
- Report Number(s):
- LBNL--51604; BnR: KC0201010
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 12 Vol. 82; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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