Conformational Rearrangements in Interfacial Region of Polydimethylsiloxane Melt Films

Journal Article · Sat Dec 31 23:00:00 EST 2005 · Polymer

DOI:https://doi.org/10.1016/j.polymer.2005.12.010· OSTI ID:914246

Evmenenko, G; Mo, H; Kewalramani, S; Dutta, P

Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 Angstroms) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).

• Research Organization: Brookhaven National Laboratory (BNL) National Synchrotron Light Source
• Sponsoring Organization: Doe - Office Of Science
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 914246
• Report Number(s): BNL--78814-2007-JA
• Journal Information: Polymer, Journal Name: Polymer Vol. 47; ISSN 0032-3861; ISSN POLMAG
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
MOLECULAR WEIGHT
REFLECTIVITY
SILICA
SYNCHROTRONS
THICKNESS
THIN FILMS
national synchrotron light source