Conformational rearrangements in interfacial region of polydimethylsiloxane melt films
- NWU
Abstract not provided
- Research Organization:
- Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1007718
- Journal Information:
- Polymer, Journal Name: Polymer Journal Issue: (3) ; 01, 2006 Vol. 47
- Country of Publication:
- United States
- Language:
- ENGLISH
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