Chemical States And Electrical Properties of a High-K Metal Oxide/Silicon Interface With Oxygen-Gettering Titanium-Metal-Overlayer
Journal Article
·
· Appl.Phys.Lett.89:142912,2006
OSTI ID:912572
No abstract prepared.
- Research Organization:
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-76SF00515
- OSTI ID:
- 912572
- Report Number(s):
- SLAC-REPRINT-2006-314; APPLAB; TRN: US200801%%1090
- Journal Information:
- Appl.Phys.Lett.89:142912,2006, Vol. 89; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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