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Title: Radiation Damage Mechanisms for Luminescence in Eu-doped GaN

Journal Article · · Journal of Applied Physics
OSTI ID:907874

Thin films of Eu-doped GaN are irradiated with 500 keV He{sup +} ions to understand radiation damage mechanisms and to quantify luminescence efficiency. Ion beam induced luminescence was monitored spectroscopically as function of fluence. Behavior observed is consistent with simultaneous creation of non-radiative defects and destruction of luminescent centers associated with the 4f-4f core-level transition in Eu{sup 3+}. This model contrasts with a previous description which takes into account only non-radiative defect generation in GaN:Eu. Based on light from a BaF{sub 2} scintillator standard, the luminescent energy generation efficiency of GaN:Eu films doped to {approx}3 x 10{sup 18} cm{sup -3} Eu is estimated to be {approx}0.1%.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
907874
Report Number(s):
UCRL-JRNL-216865; JAPIAU; TRN: US200721%%444
Journal Information:
Journal of Applied Physics, Vol. 101, Issue 054902; ISSN 0021-8979
Country of Publication:
United States
Language:
English