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A comparative study of residual stresses and microstructure in a-tC films

Conference ·
OSTI ID:90724
 [1]; ;  [2]
  1. Univ. of Maryland, College Park, MD (United States). Dept. of Materials and Nuclear Engineering
  2. Sandia National Labs., Albuquerque, NM (United States); and others

We compare the microstructure of highly tetrahedrally-coordinated-amorphous carbon (a-tC) films prepared by pulsed laser deposition (PLD), measured using both small angle x-ray scattering (SAXS) and x-ray reflectivity, with other physical properties such as film stress and electrical resistivity. These properties are controlled by the film growth conditions and film thicknesses. Films prepared under vacuum conditions exhibit a shift in the measured mass density, as a function of laser energy density. The density for films approximately 600{angstrom} thick approach that of crystalline diamond. The measured densities for thicker, approximately 1000{angstrom} films, exhibit a smaller shift, and a lower density value. This shift correlates to observed changes in film stress and electrical resistivity. The small angle signal of the reflectivity spectra suggests the presence of layering, or in-plane density variations or a combination of both within the films.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
90724
Report Number(s):
SAND--94-2864C; CONF-950412--27; ON: DE95014841
Country of Publication:
United States
Language:
English

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