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Title: Wet etching of sol-gel deposited PLZT for photonic crystal applications.

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Sandia National Laboratories
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Conference: Proposed for presentation at the Photonics West 2006 held January 22-26, 2006 in San Jose, CA.
Country of Publication:
United States

Citation Formats

Clem, Paul Gilbert, and Subramania,Ganapathi Subramanian. Wet etching of sol-gel deposited PLZT for photonic crystal applications.. United States: N. p., 2006. Web.
Clem, Paul Gilbert, & Subramania,Ganapathi Subramanian. Wet etching of sol-gel deposited PLZT for photonic crystal applications.. United States.
Clem, Paul Gilbert, and Subramania,Ganapathi Subramanian. Sun . "Wet etching of sol-gel deposited PLZT for photonic crystal applications.". United States. doi:.
title = {Wet etching of sol-gel deposited PLZT for photonic crystal applications.},
author = {Clem, Paul Gilbert and Subramania,Ganapathi Subramanian},
abstractNote = {},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 2006},
month = {Sun Jan 01 00:00:00 EST 2006}

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  • No abstract prepared.
  • Improved dielectric and ferroelectric properties are reported for the sol-gel preparation of lead-based perovskite-structure thin layers by a novel processing technique. The method uses a PbO cover coat to avoid the formation of additional phases on the surface. The deleterious effect of a {open_quotes}pyrochlore-type{close_quotes} phase, which is not present when a PbO cover coat is used, is attributed to PbO loss from the surface during thermal processing. Examples are given for PZT and PLZT thin layers integrated on Si with and without a PbO cover coat. Crystallization temperatures and times were reduced for the attainment of single-phase perovskite material. Themore » dielectric, ferroelectric, and piezoelectric properties were always found to be superior for coated structures.« less
  • A process and apparatus will be described for rapidly drying a wet, porous silica gel monolith at subcritical temperature and pressure without inducing any cracking of the gels. Large monolithic dry silica gels have been routinely produced by this technique. The sol is prepared by mixing TEOS with water and an acidic or basic catalyst and cast in cylindrical molds. After aging and solvent exchange with ethanol, the wet gel is immersed once again in ethanol inside a specially designed drying chamber. As the chamber is heated from outside, the ethanol is expelled from the chamber due to its ownmore » vapor pressure. The wet gel is fully exposed to a ethanol vapor environment. Further heating fully dries the gel. Process parameters for operating the drying chamber and experimental results will be presented.« less
  • Proton conducting tantalum oxide films were deposited by spin coating using a sol-gel process. The coating solutions were prepared using Ta(OC{sub 2}H{sub 5}){sub 5} as a precursor. X-ray diffraction studies determined that the sol-gel films, heat treated at temperatures below 400 C, were amorphous. Films heat treated at higher temperatures were crystalline Ta{sub 2}O{sub 5}. The solar transmission values (T{sub s}) of tantala films on glass generally range from 0.8--0.9 depending on thickness. The refractive index and the extinction coefficient were evaluated from transmittance characteristics in the UV-VIS-NIR regions. The refractive index values calculated at 550 nm increased from 1.78more » to 1.97 with increasing heat treatment from 150 to 450 C. The films heat treated at different temperatures showed low absorption with extinction coefficients of less than k=1x10{sup -3} in the visible range. Spectrophotometric and impedance spectroscopic investigations performed on Ta{sub 2}O{sub 5} films revealed that these films have protonic conductivity of 3.2x10{sup -6} S/cm. The films are suitable for proton conducting layers in electrochromic (EC) devices.« less
  • Electrochromic devices have increasing application in display devices, switchable mirrors and smart windows. A variety of vacuum deposition technologies have been used to make electrochromic devices. The sol- gel process offers an alternative approach to the synthesis of optical quality and low cost electrochromic device layers. This study summarizes the developments in sol-gel deposited electrochromic films. The sol-gel process involves the formation of oxide networks upon hydrolysis-condensation of alkoxide precursors. In this study we cover the sol-gel deposited oxides of WO[sub 3], V[sub 2]O[sub 5], TiO[sub 2], Nb[sub 2]O[sub 5], and NiO[sub x].