Critical illumination condenser for extreme ultraviolet projection lithography
Conference
·
OSTI ID:90214
A condenser system couples a radiation source to an imaging system. The authors have designed a critical illumination condenser system which meets the technical challenges of extreme ultraviolet projection lithography based on a ring field imaging system and a laser produced plasma source. The optical system, a three spherical mirror optical design, is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. This type of condenser optical design is sufficiently versatile to be employed with two distinct systems, one from Lawrence Livermore National Laboratory and one from AT and T/Sandia.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 90214
- Report Number(s):
- UCRL-JC--119634; CONF-9409177--16; ON: DE95014683
- Country of Publication:
- United States
- Language:
- English
Similar Records
Critical illumination condenser for x-ray lithography
Critical illumination condenser for x-ray lithography
Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas
Patent
·
Tue Apr 07 00:00:00 EDT 1998
·
OSTI ID:871460
Critical illumination condenser for x-ray lithography
Patent
·
Tue Apr 07 00:00:00 EDT 1998
·
OSTI ID:619396
Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas
Technical Report
·
Thu Jun 01 00:00:00 EDT 1995
·
OSTI ID:93460