Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

Critical illumination condenser for x-ray lithography

Patent ·
OSTI ID:871460
 [1];  [2]
  1. Pleasanton, CA
  2. Livermore, CA
+ Show Author Affiliations

A critical illumination condenser system, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 .mu.m source and requires a magnification of 26.times.. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 5737137
OSTI ID:
871460
Country of Publication:
United States
Language:
English

References (4)

Laser driver for soft-x-ray projection lithography journal January 1993
Front-end design issues in soft-x-ray projection lithography journal January 1993
X-ray production ~13 nm from laser-produced plasmas for projection x-ray lithography applications journal January 1993
Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography journal January 1993

Similar Records

Critical illumination condenser for x-ray lithography
Patent · Tue Apr 07 00:00:00 EDT 1998 · OSTI ID:619396
Critical illumination condenser for extreme ultraviolet projection lithography
Conference · Wed Mar 01 23:00:00 EST 1995 · OSTI ID:90214
Condenser for photolithography system
Patent · Mon Mar 01 23:00:00 EST 2004 · OSTI ID:1174750

Related Subjects

/359/355/378/
200
25
26
50
adapted
angles
bandwidth
based
capable
cassegrain
coating
condenser
configuration
constitutes
critical
critical illumination
degrees
eight
euv
example
extent
extreme
extreme ultraviolet
field
final
illuminating
illumination
illumination condenser
image
imaging
incident
inverse
laser
laser plasma
laser produced
linear
lithography
magnification
mask
mirror
mirrors
multilayer
multilayer reflective
narrow
narrow band
narrow bandwidth
obstruction
particularly
particularly adapted
plane
plasma
plasma source
primary
primary mirror
produced
produced plasma
projection
projection lithography
provides
pupil
radiation
radiation incident
reflective
reflective coating
relay
requires
scanning
schwarzschild
source
spherical
spherical mirror
spherical mirrors
third
third mirror
times
ultraviolet
utilized
vary
x-ray
x-ray lithography