Lithographic characterization of the field dependent astigmatismand alignment stability of a 0.3 numerical aperture extreme ultravioletmicrofield optic
Journal Article
·
· The Journal of Vacuum Science and Technology B
No abstract prepared.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Director. Office of Science. Office of AdvancedScientific Computing Research. Office of Basic Energy Sciences,SEMATECH
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 899737
- Report Number(s):
- LBNL-60355; R&D Project: M30007; BnR: 600303000; TRN: US200708%%512
- Journal Information:
- The Journal of Vacuum Science and Technology B, Vol. 23, Issue 5; Related Information: Journal Publication Date: Sep/Oct 2005
- Country of Publication:
- United States
- Language:
- English
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