Investigation of passive films on alpha2 and gamma titanium aluminides by X-ray photoelectron spectroscopy
Passive films on alpha2 and gamma titanium aluminide formed potentiostatically in sodium hydroxide (NaOH) and sulfuric acid (H2SO4) solutions were studied by x-ray photoelectron microscopy (XPS). In NaOH, potentiostatic experiments showed that titanium aluminides had very similar passive current densities to that of Ti. XPS sputter depth profile showed nearly no Al present in the outer layer of the passive films. In H2SO4, passive current densities increased for specimens with increasing Al content. XPS sputter depth profile showed that Al was enriched in outer layers of the passive films. These results indicated that the passive film dissolution rate increased with increasing amounts of Al in the passive film for titanium aluminides.
- Research Organization:
- Albany Research Center (ARC), Albany, OR
- Sponsoring Organization:
- USDOE - Office of Fossil Energy (FE)
- OSTI ID:
- 896193
- Report Number(s):
- DOE/ARC-1999-012
- Journal Information:
- Corrosion (Houston), Journal Name: Corrosion (Houston) Journal Issue: 7 Vol. 55; ISSN 0010-9312
- Publisher:
- Nace International, Houston, TX
- Country of Publication:
- United States
- Language:
- English
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