Investigation of passive films on {alpha}{sub 2} and {gamma} titanium aluminides by X-ray photoelectron spectroscopy

Journal Article · Thu Jul 01 04:00:00 EDT 1999 · Corrosion (Houston)

DOI:https://doi.org/10.5006/1.3284017· OSTI ID:20013145

Ziomek-Moroz, M; Su, W; Covino, Jr, B S

Passive films on {alpha}{sub 2} and {gamma} titanium aluminide formed potentiostatically in sodium hydroxide (NaOH) and sulfuric acid (H{sub 2}SO{sub 4}) solutions were studied by x-ray photoelectron spectroscopy (XPS). In NaOH, potentiostatic experiments showed that titanium aluminides had very similar passive current densities to that of Ti. XPS sputter depth profile showed nearly no Al present in the outer layer of the passive films. In H{sub 2}SO{sub 4}, passive current densities increased for specimens with increasing Al content. XPS sputter depth profile showed that Al was enriched in outer layers of the passive films. These results indicated that the passive film dissolution rates increased with increasing amounts of Al in the passive film for titanium aluminides.

• Research Organization: Oregon Graduate Inst., Portland, OR (US)
• OSTI ID: 20013145
• Journal Information: Corrosion (Houston), Journal Name: Corrosion (Houston) Journal Issue: 7 Vol. 55; ISSN 0010-9312; ISSN CORRAK
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM ALLOYS
FILMS
INTERMETALLIC COMPOUNDS
PASSIVATION
PHOTOELECTRON SPECTROSCOPY
POTENTIOSTATS
SODIUM HYDROXIDES
SULFURIC ACID
TITANIUM ALLOYS