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U.S. Department of Energy
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Measuring stress gradients by etch-back in annealed (ta-C) thin films.

Conference ·
OSTI ID:886656

No abstract prepared.

Research Organization:
Sandia National Laboratories
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
886656
Report Number(s):
SAND2005-8016C
Country of Publication:
United States
Language:
English

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