High Spatial Resolution Stress Measurements using Synchrotronbased Scanning X-Ray Microdiffraction with White or Monochromaticbeam
Journal Article
·
· Materials Science & Engineering A
Scanning X-ray microdiffraction (mu SXRD) combines the use of high brilliance synchrotron sources with state-of-the-art achromatic X-ray focusing optics and large area detector technology. Using either white or monochromatic beams, it allows for orientation and strain/stress mapping of polycrystalline thin films with submicron spatial resolution.The present paper will focus on three applications performed at the Advanced Light Source: the study of local plasticity in aluminum thin films, the study of the spontaneous growth of tin whiskers in lead-free solder finish and the measurement of strain field around thin film bucklings.
- Research Organization:
- Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
- Sponsoring Organization:
- USDOE Director. Office of Science. Office of Basic EnergySciences. Materials Science and Engineering Division
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 883780
- Report Number(s):
- LBNL--58978; BnR: KC0204016
- Journal Information:
- Materials Science & Engineering A, Journal Name: Materials Science & Engineering A Vol. 399
- Country of Publication:
- United States
- Language:
- English
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