Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

Journal Article · Wed Jun 15 04:00:00 EDT 2005 · Journal of Microlithography, Microfabrication and Microsystems

OSTI ID:883757

Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 883757
• Report Number(s): UCRL-JRNL-213175
• Journal Information: Journal of Microlithography, Microfabrication and Microsystems, Journal Name: Journal of Microlithography, Microfabrication and Microsystems Journal Issue: 2 Vol. 5
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
MICROSTRUCTURE
OPTIMIZATION
ORIENTATION
OXIDATION
PERFORMANCE
SIMULATION
STABILITY
SURFACE PROPERTIES
TRANSMISSION ELECTRON MICROSCOPY