Oxidation resistance of Ru-capped EUV multilayers

Conference · Wed Feb 23 04:00:00 EST 2005

DOI:https://doi.org/10.1117/12.597443· OSTI ID:15011620

Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J; Nguyen, N; Baker, S; Robinson, J C; Taylor, J S; Clift, M; Aquila, A; Gullikson, E M; Edwards, N G

Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. Same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.

• Research Organization: Lawrence Livermore National Lab., Livermore, CA (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 15011620
• Report Number(s): UCRL-PROC-209970
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
MICROSTRUCTURE
OPTIMIZATION
OXIDATION
PERFORMANCE
SIMULATION
STABILITY
SURFACE PROPERTIES
TEXTURE
TRANSMISSION ELECTRON MICROSCOPY