Formation of Cobalt Silicide Films by Ion Beam Deposition

Journal Article · Sun Jan 01 04:00:00 EST 2006 · Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms

DOI:https://doi.org/10.1016/j.nimb.2005.08.134· OSTI ID:881926

Zhang, Yanwen; McCready, David E; Wang, Chong M; Young, James S; Mckinley, Mathew I; Whitlow, Harry J; Razpet, Alenka; Possnert, Göran; Zhang, Tonghe; Wu, Yuguang

Thin films of cobalt silicide are widely used as metallization in very large-scale integrated electronic circuits. In this study, Co ions were deposited on Si (111) wafers by a high beam current filter metal vacuum arc deposition (FMEVAD) system. Surface silicide films were formed after annealing from 500 to 700 C for 30 minutes. Cobalt depth profiles and contaminations were determined using Rutherford backscattering spectrometry (RBS) and time-of-flight energy elastic recoil detection analysis (ToF-E ERDA). The polycrystalline cobalt silicide phases formed were characterized by grazing-incidence x-ray diffraction (GIXRD). The surface topography development and interfaces have been investigated by transmission electron microscopy (TEM) and scanning electron microscopy (SEM). The results show that a thin CoSi2 surface layer with both a smooth surface topography and sharp interface can be achieved by annealing at 700 C. The CoSi phase and O contamination were observed in the samples that were annealed at lower temperatures.

• Research Organization: Pacific Northwest National Laboratory (PNNL), Richland, WA (US)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-76RL01830
• OSTI ID: 881926
• Report Number(s): PNNL-SA-42484; KC0201020; KP1301030
• Journal Information: Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms, Journal Name: Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms Journal Issue: 1-2 Vol. 242
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COBALT IONS
COBALT SILICIDES
ENERGY BEAM DEPOSITION
PHASE STUDIES
THIN FILMS
cobalt silicide
electron microscopy
ion beam analysis
synthesis