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Title: System Configured For Applying Multiple Modifying Agents To A Substrate.

Abstract

The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.

Inventors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Idaho Falls, ID
Publication Date:
Research Org.:
BECHTEL BWXT IDAHO LLC
OSTI Identifier:
880197
Patent Number(s):
US 6,962,731
Application Number:
10/669662
Assignee:
Bechtel BWXT Idaho, LLC (Idaho Falls, ID)
DOE Contract Number:  
AC07-99ID13727; AC07-94ID13223
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Propp, W Alan, Argyle, Mark D, Janikowski, Stuart K, Fox, Robert V, Toth, William J, Ginosar, Daniel M, Allen, Charles A, and Miller, David L. System Configured For Applying Multiple Modifying Agents To A Substrate.. United States: N. p., 2005. Web.
Propp, W Alan, Argyle, Mark D, Janikowski, Stuart K, Fox, Robert V, Toth, William J, Ginosar, Daniel M, Allen, Charles A, & Miller, David L. System Configured For Applying Multiple Modifying Agents To A Substrate.. United States.
Propp, W Alan, Argyle, Mark D, Janikowski, Stuart K, Fox, Robert V, Toth, William J, Ginosar, Daniel M, Allen, Charles A, and Miller, David L. 2005. "System Configured For Applying Multiple Modifying Agents To A Substrate.". United States. https://www.osti.gov/servlets/purl/880197.
@article{osti_880197,
title = {System Configured For Applying Multiple Modifying Agents To A Substrate.},
author = {Propp, W Alan and Argyle, Mark D and Janikowski, Stuart K and Fox, Robert V and Toth, William J and Ginosar, Daniel M and Allen, Charles A and Miller, David L},
abstractNote = {The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.},
doi = {},
url = {https://www.osti.gov/biblio/880197}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {11}
}