Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

Diffraction spectral filter for use in extreme-UV lithography condenser

Patent ·
OSTI ID:874831
 [1];  [2];  [3]
  1. Albuquerque, NM
  2. Castro Valley, CA
  3. Livermore, CA
+ Show Author Affiliations

A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.

Research Organization:
SANDIA CORP
DOE Contract Number:
AC04-94AL85000
Assignee:
EUV LLC (Santa Clara, CA)
Patent Number(s):
US 6469827
OSTI ID:
874831
Country of Publication:
United States
Language:
English

References (3)

EUV optical design for a 100-nm CD imaging system
  • Sweeney, Donald W.; Hudyma, Russell M.; Chapman, Henry N.
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309559
conference June 1998
New optics design methodology using diffraction grating on spherical mirrors for soft x-ray projection lithography journal March 1995
Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings journal April 1994

Similar Records

Extreme-UV lithography condenser
Patent · Sun Dec 31 23:00:00 EST 2000 · OSTI ID:873643
Condenser for extreme-UV lithography with discharge source
Patent · Sun Dec 31 23:00:00 EST 2000 · OSTI ID:873974
Condenser for illuminating a ringfield camera with synchrotron emission light
Patent · Tue Apr 30 00:00:00 EDT 1996 · OSTI ID:224984

Related Subjects

/359/355/378/
beam
camera
collecting
comprising
condenser
continuous
cooling
devices
diffraction
diffractive
elements
employed
extreme-uv
extreme-uv lithography
filter
generated
generates
generating
heat
light
lithography
optical
projection
radiation
remove
remove heat
ringfield
separating
source
spectral
spectrum
wavelength