Extreme-UV lithography condenser

Patent · Mon Jan 01 00:00:00 EST 2001

OSTI ID:873643

Sweatt, William C ^[1]; Sweeney, Donald W ^[2]; Shafer, David ^[3]; McGuire, James ^[4]

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1. Albuquerque, NM
2. San Ramon, CA
3. Fairfield, CT
4. Pasadena, CA

Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV LLC (Santa Clara, CA)
• Patent Number(s): US 6210865
• OSTI ID: 873643
• Country of Publication: United States
• Language: English

Related Subjects

extreme-uv
lithography
condenser
ringfield
camera
projection
series
segments
parent
aspheric
mirror
foci
quasi-point
source
radiation
radius
beams
translated
rotated
sets
mirrors
pass
entrance
pupil
fall
coincident
image
set
correcting
common
emanates
concave
positioned
shape
beam
segment
chord
angle
25
85
degrees
60
extreme-uv lithography
projection lithography
entrance pupil
concave mirror
beam segment
lithography condenser
beams pass
parent aspheric
ringfield camera
aspheric mirror
si-point source
beams translated
correcting mirror
/430/359/378/