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Extreme-UV lithography condenser

Patent ·
OSTI ID:873643
 [1];  [2];  [3];  [4]
  1. Albuquerque, NM
  2. San Ramon, CA
  3. Fairfield, CT
  4. Pasadena, CA
+ Show Author Affiliations

Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

Research Organization:
SANDIA CORP
DOE Contract Number:
AC04-94AL85000
Assignee:
EUV LLC (Santa Clara, CA)
Patent Number(s):
US 6210865
OSTI ID:
873643
Country of Publication:
United States
Language:
English

References (2)

New optics design methodology using diffraction grating on spherical mirrors for soft x-ray projection lithography journal March 1995
Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings journal April 1994

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/430/359/378/
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chord
coincident
common
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condenser
correcting
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extreme-uv
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parent
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rotated
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segments
series
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si-point source
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