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Regeneration of strong-base anion-exchange resins by sequential chemical displacement

Patent ·
OSTI ID:874718
A method for regenerating strong-base anion exchange resins utilizing a sequential chemical displacement technique with new regenerant formulation. The new first regenerant solution is composed of a mixture of ferric chloride, a water-miscible organic solvent, hydrochloric acid, and water in which tetrachloroferrate anion is formed and used to displace the target anions on the resin. The second regenerant is composed of a dilute hydrochloric acid and is used to decompose tetrachloroferrate and elute ferric ions, thereby regenerating the resin. Alternative chemical displacement methods include: (1) displacement of target anions with fluoroborate followed by nitrate or salicylate and (2) displacement of target anions with salicylate followed by dilute hydrochloric acid. The methodology offers an improved regeneration efficiency, recovery, and waste minimization over the conventional displacement technique using sodium chloride (or a brine) or alkali metal hydroxide.
Research Organization:
LOCKHEED MARTIN ENERGY RES COR
DOE Contract Number:
AC05-96OR22464
Assignee:
U.T. Battelle, LLC (Oak Ridge, TN)
Patent Number(s):
US 6448299
OSTI ID:
874718
Country of Publication:
United States
Language:
English

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