Thermal barrier coating having high phase stability
Patent
·
OSTI ID:873842
- Oviedo, FL
A device (10) comprising a substrate (22) having a deposited ceramic thermal barrier coating layer (20) characterized by a microstructure having gaps (28) where the thermal barrier coating (20) consists essentially of a pyrochlore crystal structure having a chemical formula consisting essentially of A.sup.n+.sub.2-x B.sup.m+.sub.2+x O.sub.7-y, where A is selected from the group of elements selected from La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and mixtures thereof; where B is selected from the group of elements selected from Zr, Hf, Ti and mixtures thereof; n and m are the valence of A and B respectively, and for -0.5.ltoreq.x.ltoreq.0.5, ##EQU1## and excluding the following combinations for x=0, y=0: A=La and B=Zr; A=La and B=Hf; A=Gd and B=Hf; and A=Yb and B=Ti.
- Research Organization:
- WESTINGHOUSE ELECTRIC CORP
- DOE Contract Number:
- AC05-95OR22242
- Assignee:
- Siemens Westinghouse Power Corporation (Orlando, FL)
- Patent Number(s):
- US 6258467
- OSTI ID:
- 873842
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
-0
/428/416/427/
10
2-x
20
22
28
7-y
barrier
barrier coating
ceramic
ceramic thermal
characterized
chemical
chemical formula
coating
coating layer
combinations
comprising
consisting
consisting essentially
consists
consists essentially
crystal
crystal structure
deposited
device
elements
elements selected
equ1
essentially
eu
excluding
following
formula
gaps
gd
hf
layer
ltoreq
microstructure
mixtures
phase
phase stability
pyrochlore
respectively
selected
stability
structure
substrate
tb
thermal
thermal barrier
tm
valence
zr
/428/416/427/
10
2-x
20
22
28
7-y
barrier
barrier coating
ceramic
ceramic thermal
characterized
chemical
chemical formula
coating
coating layer
combinations
comprising
consisting
consisting essentially
consists
consists essentially
crystal
crystal structure
deposited
device
elements
elements selected
equ1
essentially
eu
excluding
following
formula
gaps
gd
hf
layer
ltoreq
microstructure
mixtures
phase
phase stability
pyrochlore
respectively
selected
stability
structure
substrate
tb
thermal
thermal barrier
tm
valence
zr