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Title: Cleaning process for EUV optical substrates

Abstract

A cleaning process for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.

Inventors:
 [1];  [2]
  1. (Sunol, CA)
  2. (Mt. Kiso, NY)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
872534
Patent Number(s):
US 5958143
Assignee:
Regents of University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
cleaning; process; euv; optical; substrates; surfaces; demanding; cleanliness; requirements; extreme-ultraviolet; proper; prior; applying; reflective; coatings; thereon; critical; fabrication; optics; lithographic; systems; example; involves; ultrasonic; acetone; methanol; ph; neutral; soap; fl-70; followed; rinsing; de-ionized; water; drying; dry; filtered; nitrogen; conjunction; spin-rinse; optical substrates; reflective coating; reflective coatings; ultrasonic cleaning; process involves; optical substrate; euv optical; cleaning process; /134/427/

Citation Formats

Weber, Frank J., and Spiller, Eberhard A. Cleaning process for EUV optical substrates. United States: N. p., 1999. Web.
Weber, Frank J., & Spiller, Eberhard A. Cleaning process for EUV optical substrates. United States.
Weber, Frank J., and Spiller, Eberhard A. Fri . "Cleaning process for EUV optical substrates". United States. https://www.osti.gov/servlets/purl/872534.
@article{osti_872534,
title = {Cleaning process for EUV optical substrates},
author = {Weber, Frank J. and Spiller, Eberhard A.},
abstractNote = {A cleaning process for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1999},
month = {Fri Jan 01 00:00:00 EST 1999}
}

Patent:

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