Cleaning process for EUV optical substrates

Patent · Fri Jan 01 00:00:00 EST 1999

OSTI ID:872534

Weber, Frank J ^[1]; Spiller, Eberhard A ^[2]

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1. Sunol, CA
2. Mt. Kiso, NY

A cleaning process for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 5958143
• OSTI ID: 872534
• Country of Publication: United States
• Language: English

Related Subjects

cleaning
process
euv
optical
substrates
surfaces
demanding
cleanliness
requirements
extreme-ultraviolet
proper
prior
applying
reflective
coatings
thereon
critical
fabrication
optics
lithographic
systems
example
involves
ultrasonic
acetone
methanol
ph
neutral
soap
fl-70
followed
rinsing
de-ionized
water
drying
dry
filtered
nitrogen
conjunction
spin-rinse
optical substrates
reflective coating
reflective coatings
ultrasonic cleaning
process involves
optical substrate
euv optical
cleaning process
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