Cleaning process for EUV optical substrates
Patent
·
OSTI ID:20013832
A cleaning process is disclosed for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.
- Sponsoring Organization:
- US Department of Energy
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 20013832
- Country of Publication:
- United States
- Language:
- English
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