Method for correcting imperfections on a surface

Patent · Tue Sep 07 00:00:00 EDT 1999

OSTI ID:872501

Sweatt, William C ^[1]; Weed, John W ^[1]

---

1. Albuquerque, NM

A process for producing near perfect optical surfaces. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.

• Research Organization: SANDIA CORP
• Assignee: Sandia Corporation (Albuquerque, NM)
• Patent Number(s): US 5948468
• Application Number: 08/850,665
• OSTI ID: 872501
• Country of Publication: United States
• Language: English

Related Subjects

/427/
acceptable
acceptable level
amorphous
aperture
apertures
based
bonds
correct
correcting
deposition
deposition process
designed
designed based
desired
determine
deviations
dual aperture
fabricated
filled
fixed
geometries
glass
glass substrate
grid
imperfections
individual
level
mask
material
measured
measurement
method
monoxide
multi-aperture
near
near perfect
optical
optical surface
optical surfaces
perfect
polished
previously
process
produce
producing
producing near
silicon
silicon monoxide
sizes
spacing
substrate
surface
surfaces
thickness
vacuum
vacuum deposition
variable
variable aperture
various