Characterization of imperfections in thin-film multilayer devices

Conference · Thu Dec 31 23:00:00 EST 1987

OSTI ID:6840458

Saxena, A M

The fabrication of high reflectivity multilayer monochromators usually involves depositing a greater number of bilayers than the calculated number for perfect multilayers. This deviation from ideal behavior occurs due to the presence of imperfections in layers. The imperfections are strongly dependent on the deposition process employed and the parameters during deposition. An understanding of the types of imperfections present may lead to attempts to minimize them. The imperfections should be taken into consideration for determining the sequence of d-spacing for making a supermirror. 11 refs., 4 figs., 2 tabs.

• Research Organization: Brookhaven National Lab., Upton, NY (USA)
• DOE Contract Number: AC02-76CH00016
• OSTI ID: 6840458
• Report Number(s): BNL-41688; CONF-880887-11; BIO-4469; ON: DE88016733
• Country of Publication: United States
• Language: English

Related Subjects

440300* -- Miscellaneous Instruments-- (-1989)
47 OTHER INSTRUMENTATION
BARYONS
DATA
ELEMENTARY PARTICLES
FABRICATION
FERMIONS
FILMS
HADRONS
INFORMATION
LAYERS
MEASURING INSTRUMENTS
MONOCHROMATORS
NEUTRONS
NUCLEONS
NUMERICAL DATA
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
REFLECTIVITY
SPECTROMETERS
SUBSTRATES
SURFACE PROPERTIES
THIN FILMS