Lapping slurry

Patent · Thu Dec 31 23:00:00 EST 1998

OSTI ID:872070

Simandl, Ronald F ^[1]; Upchurch, Victor S ^[2]; Leitten, Michael E ^[3]

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1. Farragut, TN
2. Powell, TN
3. Frederick, MD

Improved lapping slurries provide for easier and more thorough cleaning of alumina workpieces, as well as inhibit corrosion of the lapping table and provide for easier cleaning of the lapping equipment. The unthickened lapping slurry comprises abrasive grains such as diamond abrasive dispersed in a carrier comprising water, glycerine, and triethanolamine. The thickened lapping slurry comprises abrasive grains such as diamond abrasive dispersed in a carrier comprising water, glycerine, triethanolamine, a water soluble silicate, and acid.

• Research Organization: LOCKHEED MARTIN ENRGY SYST INC
• DOE Contract Number: AC05-84OR21400
• Assignee: Lockheed Martin Energy Systems, Inc. (Oak Ridge, TN)
• Patent Number(s): US 5855633
• OSTI ID: 872070
• Country of Publication: United States
• Language: English

Related Subjects

/51/106/510/
abrasive
abrasive grain
abrasive grains
acid
alumina
carrier
cleaning
comprises
comprising
comprising water
corrosion
diamond
dispersed
easier
equipment
glycerine
grains
improved
inhibit
lapping
lapping slurry
provide
silicate
slurries
slurry
slurry comprises
soluble
table
thickened
thorough
triethanolamine
unthickened
water
water soluble
workpieces