Plasma spraying method for forming diamond and diamond-like coatings

Title: Plasma spraying method for forming diamond and diamond-like coatings

Full Record
Other Related Research

Abstract

A method and composition for the deposition of a thick layer (10) of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition (12) including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate (20). The softened or molten composition (18) crystallizes on the substrate (20) to form a thick deposition layer (10) comprising at least a diamond or diamond-like material. The selected composition (12) includes at least glassy carbon as a primary constituent (14) and may include at least one secondary constituent (16). Preferably, the secondary constituents (16) are selected from the group consisting of at least diamond powder, boron carbide (B.sub.4 C) powder and mixtures thereof.

Inventors:

Holcombe, Cressie E ^[1]; Seals, Roland D ^[2]; Price, R Eugene ^[3]

Farragut, TN
Oak Ridge, TN
Knoxville, TN

Publication Date:: 1997-01-01

Research Org.:: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

OSTI Identifier:: 870980

Patent Number(s):: US 5635254

Assignee:: Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)

DOE Contract Number:: AC05-84OR21400

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: plasma; spraying; method; forming; diamond; diamond-like; coatings; composition; deposition; thick; layer; 10; material; temperature; processing; selected; 12; including; glassy; carbon; heated; direct; current; device; softening; inert; atmosphere; propelled; quickly; quenched; substrate; 20; softened; molten; 18; crystallizes; form; comprising; primary; constituent; 14; secondary; 16; preferably; constituents; consisting; powder; boron; carbide; mixtures; thick layer; plasma spray; boron carbide; direct current; inert atmosphere; plasma spraying; glassy carbon; selected temperature; temperature process; selected substrate; diamond-like material; selected composition; diamond powder; spraying method; current plasma; /427/

Citation Formats


                    Holcombe, Cressie E, Seals, Roland D, and Price, R Eugene. Plasma spraying method for forming diamond and diamond-like coatings.  United States: N. p., 1997. 
        Web.

Copy to clipboard


                    Holcombe, Cressie E, Seals, Roland D, & Price, R Eugene. Plasma spraying method for forming diamond and diamond-like coatings.  United States.

Copy to clipboard


                    Holcombe, Cressie E, Seals, Roland D, and Price, R Eugene. Wed .  
        "Plasma spraying method for forming diamond and diamond-like coatings".  United States.  https://www.osti.gov/servlets/purl/870980.

Copy to clipboard


                    
@article{osti_870980,

  title        = {Plasma spraying method for forming diamond and diamond-like coatings},

  author       = {Holcombe, Cressie E and Seals, Roland D and Price, R Eugene},

  abstractNote = {A method and composition for the deposition of a thick layer (10) of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition (12) including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate (20). The softened or molten composition (18) crystallizes on the substrate (20) to form a thick deposition layer (10) comprising at least a diamond or diamond-like material. The selected composition (12) includes at least glassy carbon as a primary constituent (14) and may include at least one secondary constituent (16). Preferably, the secondary constituents (16) are selected from the group consisting of at least diamond powder, boron carbide (B.sub.4 C) powder and mixtures thereof.},

  doi          = {},

  url          = {https://www.osti.gov/biblio/870980},
  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1997},

  month        = {1}

}

Copy to clipboard

Patent:

View Patent

Save / Share:

Export Metadata

Save to My Library

Similar records in OSTI.GOV collections:

Plasma spraying method for forming diamond and diamond-like coatings

Patent Holcombe, C E ; Seals, R D ; Price, R E

A method and composition is disclosed for the deposition of a thick layer of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate. The softened or molten composition crystallizes on the substrate to form a thick deposition layer comprising at least a diamond or diamond-like material. The selected composition includes at least glassy carbon as a primary constituent andmore »« less
Chemical vapor deposited diamond-on-diamond powder composites (LDRD final report)

Technical Report Panitz, J K ; Hsu, W L ; Tallant, D R ; ...

Densifying non-mined diamond powder precursors with diamond produced by chemical vapor infiltration (CVI) is an attractive approach for forming thick diamond deposits that avoids many potential manufacturability problems associated with predominantly chemical vapor deposition (CVD) processes. The authors developed techniques for forming diamond powder precursors and densified these precursors in a hot filament-assisted reactor and a microwave plasma-assisted reactor. Densification conditions were varied following a fractional factorial statistical design. A number of conclusions can be drawn as a result of this study. High density diamond powder green bodies that contain a mixture of particle sizes solidify more readily than moremore »« less
https://doi.org/10.2172/206565

Full Text Available
Method of making a Josephson junction with a diamond-like carbon insulating barrier

Patent Hed, A Z

This patent describes a method of making a Josephson junction. It comprises depositing upon a substrate a first layer of high-temperature superconductive oxide having a critical temperature above 23 K.; depositing on the first layer to a thickness in excess of 200 angstroms an insulating layer of diamond-like carbon resistant to cation diffusion therethrough and incapable of interdiffusing with superconductive oxides of the junction; plasma etching the insulating layer to leave the insulating layer with a thickness of 20 to 100 angstroms on the first layer; to leave a continuous film thereof on the first layer of a thickness ofmore »« less
Understanding heterogeneity in Genesis diamond-like carbon film using SIMS analysis of implants

Journal Article Jurewicz, Amy J. G. ; Burnett, Don S. ; Rieck, Karen D. ; ... - Journal of Materials Science

An amorphous diamond-like carbon film deposited on silicon made at Sandia National Laboratory by pulsed laser deposition was one of several solar wind (SW) collectors used by the Genesis Mission (NASA Discovery Class Mission #5). The film was ~1 μm thick, amorphous, anhydrous, and had a high ratio of sp ³–sp ² bonds (>50%). For 27 months of exposure to space at the first We passively irradiated lagrange point, the collectors, with SW (H fluence ~2 × 10 ¹⁶ ions cm ^-2; He fluence ~8 × 10 ¹⁴ ions cm ^-2). The radiation damage caused by the implanted H ionsmore »« less
https://doi.org/10.1007/s10853-017-1267-3

Full Text Available
Stress reduction in PACVD amorphous diamond coatings by boron addition

Book Wagner, V ; Sporken, R ; Caudano, R ; ...

The applications of super hard coatings of diamond-like carbon (DLC) films are often limited by adhesion problems caused by intrinsic stress in the deposited layer due to the PACVD growth process. One approach to reduce the stress are less optimal process parameters. However, they also affect the desired high hardness of the films. Their approach in this study is to add B{sub 2}H{sub 6} to the gas mixture, which shifts the composition towards another very hard compound (B{sub 4}C). A sequence of amorphous B{sub x}C{sub 1{minus}x}:H films with a thickness of 0.5 {micro}m and a boron content between 0 andmore »« less

Similar Records