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Title: Propenyl ether monomers for photopolymerization

Abstract

Propenyl ether monomers of formula V A(OCH.dbd.CHCH.sub.3).sub.n wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of formula V together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.

Inventors:
 [1]
  1. (Clifton Park, NY)
Publication Date:
Research Org.:
Rensselaer Polytechnic Inst., Troy, NY (United States)
OSTI Identifier:
870651
Patent Number(s):
US 5567858
Assignee:
Rensselaer Polytechnic Institute (Troy, NY) CHO
DOE Contract Number:  
FG02-91ER12117
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
propenyl; monomers; photopolymerization; formula; och; dbd; chch; integer; six; selected; cyclic; ethers; polyether; alkanes; disclosed; readily; polymerized; presence; cationic; photoinitiators; exposed; actinic; radiation; form; poly; useful; coatings; sealants; varnishes; adhesives; compositions; preparing; polymeric; comprising; compounds; particular; processes; allyl; halides; available; alcohols; process; involves; rearranging; resulting; cationic photoinitiators; polymeric coating; polymeric coatings; propenyl ethers; process involves; readily available; form poly; cationic photoinitiator; cyclic ethers; /999/522/

Citation Formats

Crivello, James V. Propenyl ether monomers for photopolymerization. United States: N. p., 1996. Web.
Crivello, James V. Propenyl ether monomers for photopolymerization. United States.
Crivello, James V. Mon . "Propenyl ether monomers for photopolymerization". United States. https://www.osti.gov/servlets/purl/870651.
@article{osti_870651,
title = {Propenyl ether monomers for photopolymerization},
author = {Crivello, James V.},
abstractNote = {Propenyl ether monomers of formula V A(OCH.dbd.CHCH.sub.3).sub.n wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of formula V together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}

Patent:

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