Propenyl ether monomers for photopolymerization
                            Patent
                            ·
                            
                            
                            
                    
                                
                                OSTI ID:870651
                                
                            
                        Propenyl ether monomers of formula V wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of formula V together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.
- Research Organization:
- Rensselaer Polytechnic Inst., Troy, NY (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG02-91ER12117
- Assignee:
- Rensselaer Polytechnic Institute (Troy, NY)
- Patent Number(s):
- 5,567,858
- Application Number:
- 08/571,200
- OSTI ID:
- 870651
- Country of Publication:
- United States
- Language:
- English
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