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Title: Magnetic filter apparatus and method for generating cold plasma in semicoductor processing

Abstract

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.

Inventors:
 [1]
  1. (San Leandro, CA)
Publication Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
OSTI Identifier:
870553
Patent Number(s):
US 5545257
Assignee:
Electro-Graph, Inc. (Carlsbad, CA) LBNL
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
magnetic; filter; apparatus; method; generating; cold; plasma; semicoductor; processing; disclosed; providing; flood; electron; temperature; semiconductor; target; region; implantation; process; generator; coupled; allows; energy; electrons; pass; therethrough; retaining; captive; primary; form; diffused; surface; takes; plasma generator; target region; magnetic filter; energy electrons; energy electron; pass therethrough; filter apparatus; implantation process; electron temperature; /118/250/

Citation Formats

Vella, Michael C. Magnetic filter apparatus and method for generating cold plasma in semicoductor processing. United States: N. p., 1996. Web.
Vella, Michael C. Magnetic filter apparatus and method for generating cold plasma in semicoductor processing. United States.
Vella, Michael C. Mon . "Magnetic filter apparatus and method for generating cold plasma in semicoductor processing". United States. doi:. https://www.osti.gov/servlets/purl/870553.
@article{osti_870553,
title = {Magnetic filter apparatus and method for generating cold plasma in semicoductor processing},
author = {Vella, Michael C.},
abstractNote = {Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}

Patent:

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