Magnetic filter apparatus and method for generating cold plasma in semicoductor processing
Patent
·
OSTI ID:870553
- San Leandro, CA
Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
- DOE Contract Number:
- AC03-76SF00098
- Assignee:
- Electro-Graph, Inc. (Carlsbad, CA)
- Patent Number(s):
- US 5545257
- OSTI ID:
- 870553
- Country of Publication:
- United States
- Language:
- English
Development of a high proton yield plasma source with multipole confinement and a magnetic filter
|
journal | August 1987 |
Effects of internal and external magnetic fields on the characteristics of a magnetic multipole plasma source
|
journal | February 1986 |
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Related Subjects
/118/250/
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