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Process for etching mixed metal oxides

Patent ·
OSTI ID:869558
 [1];  [2]
  1. Edgewood, NM
  2. Evergreen, CO
+ Show Author Affiliations

An etching process using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstom range may be achieved by this method.

Research Organization:
AT & T CORP
DOE Contract Number:
AC04-76DP00789
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5356516
OSTI ID:
869558
Country of Publication:
United States
Language:
English

References (3)

Improved aqueous etchant for high T c superconductor materials journal April 1992
Wet Chemical Etching of High T C Superconductors by Ethylenediaminetetraacetic Acid (EDTA) journal January 1989
Machining of PZT, PT and (Mn, Zn)Fe 2 O 4 Ceramics by Laser-Induced Chemical Etching journal January 1987

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