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Title: Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Patent ·
OSTI ID:869353
 [1]
  1. Oak Ridge, TN
+ Show Author Affiliations

Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
DOE Contract Number:
AC05-84OR21400
Assignee:
Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)
Patent Number(s):
US 5320878
OSTI ID:
869353
Country of Publication:
United States
Language:
English

References (3)

Polymeric Cyanoborane, (CNBH2)n: Single Source for Chemical Vapor Deposition of Boron Nitride Films journal February 1991
Hexagonal boron nitride: Fabrication, properties and applications journal January 1989
Preparation, properties and applications of boron nitride thin films journal February 1988

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Journal Article · Fri Feb 01 00:00:00 EST 1991 · Journal of the American Ceramic Society; (United States) · OSTI ID:869353
Plasma-enhanced chemical vapor deposition of boron nitride using polymeric cyanoborane as source
Journal Article · Wed Jul 01 00:00:00 EDT 1992 · Journal of the American Ceramic Society; (United States) · OSTI ID:869353

Related Subjects

method
chemical
vapor
deposition
boron
nitride
polymeric
cyanoborane
volatilized
decomposed
thermal
microwave
plasma
energy
deposited
substrate
amorphous
film
containing
nitrogen
carbon
residual
removed
ammonia
treatment
increased
temperature
producing
adherent
essentially
stoichiometric
amorphous film
nitride film
chemical vapor
boron nitride
vapor deposition
microwave plasma
residual carbon
film containing
plasma energy
increased temperature
polymeric cyanoborane
containing boron
/427/