Recovery of niobium from irradiated targets

Patent · Sat Jan 01 04:00:00 EST 1994

OSTI ID:869200

Phillips, Dennis R ^[1]; Hamilton, Virginia T ^[1]

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1. Los Alamos, NM

A process for selective separation of niobium from proton irradiated molybdenum targets is provided and includes dissolving the molybdenum target in a hydrogen peroxide solution to form a first ion-containing solution, contacting the first ion-containing solution with a cationic resin whereby ions selected form the group consisting of molybdenum, biobium, technetium, selenium, vanadium, arsenic, germanium, zirconium and rubidium remain in a second ion-containing solution while ions selected from the group consisting of rubidium, zinc, beryllium, cobalt, iron, manganese, chromium, strontium, yttrium and zirconium are selectively adsorbed by the cationic resin; adjusting the pH of the second ion-containing solution to within a range of from about 5.0 to about 6.0; contacting the pH adjusting second ion-containing solution with a dextran-based material for a time to selectively separate niobium from the solution and recovering the niobium from the dextran-based material.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM
• DOE Contract Number: W-7405-ENG-36
• Assignee: United States of America as represented by United States Department (Washington, DC)
• Patent Number(s): US 5296203
• OSTI ID: 869200
• Country of Publication: United States
• Language: English

Related Subjects

/423/210/376/976/
adjusting
adsorbed
arsenic
beryllium
biobium
cationic
cationic resin
chromium
cobalt
consisting
contacting
containing solution
dextran-based
dextran-based material
dissolving
form
germanium
hydrogen
hydrogen peroxide
ion-containing
ion-containing solution
iron
irradiated
irradiated molybdenum
irradiated target
irradiated targets
manganese
material
molybdenum
molybdenum target
molybdenum targets
niobium
oxide solution
peroxide
peroxide solution
ph
ph adjusting
process
proton
proton irradiated
provided
range
recovering
recovery
remain
resin
resin whereby
rubidium
rubidium remain
selected
selective
selective separation
selectively
selectively adsorbed
selenium
separate
separation
solution
strontium
target
targets
technetium
time
vanadium
whereby
yttrium
zinc
zirconium