Background-reducing X-ray multilayer mirror
- Los Alamos, NM
Background-reducing x-ray multilayer mirror. A multiple-layer "wavetrap" deposited over the surface of a layered, synthetic-microstructure soft x-ray mirror optimized for reflectivity at chosen wavelengths is disclosed for reducing the reflectivity of undesired, longer wavelength incident radiation incident thereon. In three separate mirror designs employing an alternating molybdenum and silicon layered, mirrored structure overlaid by two layers of a molybdenum/silicon pair anti-reflection coating, reflectivities of near normal incidence 133, 171, and 186 .ANG. wavelengths have been optimized, while that at 304 .ANG. has been minimized. The optimization process involves the choice of materials, the composition of the layer/pairs as well as the number thereof, and the distance therebetween for the mirror, and the simultaneous choice of materials, the composition of the layer/pairs, and their number and distance for the "wavetrap."
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Number(s):
- US 5086443
- OSTI ID:
- 868164
- Country of Publication:
- United States
- Language:
- English
Reflection / Suppression Coatings For 900 - 1200 A Radiation
|
conference | July 1989 |
Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 Å to 1216 Å
|
journal | January 1988 |
Metal multilayer mirrors for EUV/ultrasoft x-ray wide-field telescopes
|
journal | January 1990 |
Layered Synthetic Microstructures: Properties And Applications In X-Ray Astronomy
|
conference | August 1979 |
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Related Subjects
133
171
186
304
alternating
ang
anti-reflection
anti-reflection coating
background-reducing
background-reducing x-ray
choice
chosen
chosen wavelength
coating
composition
deposited
designs
disclosed
distance
employing
incidence
incident
incident radiation
incident thereon
involves
layer
layered
layers
materials
minimized
mirror
mirrored
molybdenum
multilayer
multilayer mirror
multiple-layer
near
near normal
normal
normal incidence
optimization
optimized
overlaid
pair
pairs
process
process involves
radiation
radiation incident
reducing
reflectivities
reflectivity
separate
silicon
silicon layer
silicon layered
simultaneous
soft
soft x-ray
structure
surface
synthetic-microstructure
therebetween
thereon
undesired
wavelength
wavelengths
wavetrap
x-ray
x-ray mirror
x-ray multilayer