Etching process for improving the strength of a laser-machined silicon-based ceramic article
Patent
·
OSTI ID:867862
- Palos Verdes, CA
- Covina, CA
A process for improving the strength of laser-machined articles formed of a silicon-based ceramic material such as silicon nitride, in which the laser-machined surface is immersed in an etching solution of hydrofluoric acid and nitric acid for a duration sufficient to remove substantially all of a silicon film residue on the surface but insufficient to allow the solution to unduly attack the grain boundaries of the underlying silicon nitride substrate. This effectively removes the silicon film as a source of cracks that otherwise could propagate downwardly into the silicon nitride substrate and significantly reduce its strength.
- Research Organization:
- LOCKHEED MARTIN ENRGY SYST INC
- DOE Contract Number:
- AC05-84OR21400
- Assignee:
- University of Southern California (Los Angeles, CA)
- Patent Number(s):
- US 5022957
- OSTI ID:
- 867862
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
/216/65/134/252/
acid
allow
article
articles
articles formed
attack
based ceramic
boundaries
ceramic
ceramic article
ceramic mater
ceramic material
cracks
downwardly
duration
effectively
effectively remove
effectively removes
etching
etching process
film
formed
grain
grain boundaries
hydrofluoric
hydrofluoric acid
immersed
improving
insufficient
laser-machined
machined surface
material
move substantially
nitric
nitric acid
nitride
otherwise
process
propagate
reduce
remove
remove substantially
removes
residue
significantly
significantly reduce
silicon
silicon film
silicon nitride
silicon-based
silicon-based ceramic
solution
source
strength
substantially
substrate
sufficient
surface
underlying
unduly
acid
allow
article
articles
articles formed
attack
based ceramic
boundaries
ceramic
ceramic article
ceramic mater
ceramic material
cracks
downwardly
duration
effectively
effectively remove
effectively removes
etching
etching process
film
formed
grain
grain boundaries
hydrofluoric
hydrofluoric acid
immersed
improving
insufficient
laser-machined
machined surface
material
move substantially
nitric
nitric acid
nitride
otherwise
process
propagate
reduce
remove
remove substantially
removes
residue
significantly
significantly reduce
silicon
silicon film
silicon nitride
silicon-based
silicon-based ceramic
solution
source
strength
substantially
substrate
sufficient
surface
underlying
unduly