High energy XeBr electric discharge laser

Patent · Wed Dec 31 23:00:00 EST 1980

OSTI ID:863847

Sze, Robert C ^[1]; Scott, Peter B ^[2]

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1. Santa Fe, NM
2. Los Alamos, NM

A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4259645
• OSTI ID: 863847
• Country of Publication: United States
• Language: English

Related Subjects

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282
absorption
active
active medium
additionally
coherent
coherent radiation
discharge
discharge laser
donor
electric
electric discharge
energy
energy xebr
excitation
excitation source
form
formation
halogen
harpooning
hbr
laser
laser radiation
laser utilizes
medium
minimize
minimize formation
minimizing
minimizing absorption
molecular
nm
producing
producing coherent
radiation
reactions
source
undergoes
utilizes
xe
xebr
xebr laser