High energy XeBr electric discharge laser

Patent · Thu Jan 01 00:00:00 EST 1981

OSTI ID:863847

Sze, Robert C ^[1]; Scott, Peter B ^[2]

---

1. Santa Fe, NM
2. Los Alamos, NM

A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4259645
• OSTI ID: 863847
• Country of Publication: United States
• Language: English

Related Subjects

energy
xebr
electric
discharge
laser
producing
coherent
radiation
282
nm
utilizes
excitation
source
minimize
formation
molecular
minimizing
absorption
active
medium
additionally
hbr
halogen
donor
undergoes
harpooning
reactions
xe
form
excitation source
producing coherent
coherent radiation
laser radiation
electric discharge
discharge laser
active medium
laser utilizes
xebr laser
minimizing absorption
minimize formation
energy xebr
/372/