Near-edge X-ray absorption fine structure study of bondingmodifications in BN thin films by ion implantation

Journal Article · Sat Feb 12 23:00:00 EST 2005 · Applied Physics Letters

OSTI ID:862098

Jimenez, I; Jankowski, A; Terminello, L J; Carlisle, J A; Sutherland, D G.J.; Doll, G L; Mantese, J V; Tong, W M; Shuh, D K; Himpsel, F J

No abstract prepared.

• Research Organization: Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
• Sponsoring Organization: USDOE Director. Office of Science. Basic Energy Sciences,Lawrence Livermore National Laboratory; Spanish Ministerio de Educacion yCiencia
• DOE Contract Number: AC02-05CH11231
• OSTI ID: 862098
• Report Number(s): LBNL--41220; BnR: KC0302030
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 20 Vol. 68; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
ABSORPTION
BONDING
FINE STRUCTURE
ION IMPLANTATION
MODIFICATIONS
THIN FILMS