Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

High-purity, isotopically enriched bulk silicon

Journal Article · · Journal of the Electrochemical Society
OSTI ID:841564

The synthesis and characterization of dislocation-free, undoped, single crystals of Si enriched in all 3 stable isotopes is reported: {sup 28}Si (99.92%), {sup 29}Si (91.37%), and {sup 30}Si (89.8%). A silane-based process compatible with the relatively small amounts of isotopically enriched precursors that are practically available was used. The silane is decomposed to silicon on a graphite starter rod heated to 700-750 C in a recirculating flow reactor. A typical run produces 35 gm of polycrystalline Si at a growth rates of 5 {micro}m/min and conversion efficiency >95%. Single crystals are grown by the floating zone method and characterized by electrical and optical measurements. Concentrations of shallow dopants (P and B) are as low as mid-10{sup 13} cm{sup -3}. Concentrations of C and O lie below 10{sup 16} and 10{sup 15} cm{sup -3}, respectively.

Research Organization:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
Sponsoring Organization:
USDOE. Administrator for National Nuclear Security Administration. Nonproliferation and National Security Program Direction NN-20 (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
841564
Report Number(s):
LBNL--56640
Journal Information:
Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 6 Vol. 152
Country of Publication:
United States
Language:
English

Similar Records

Design, construction, and operation of a laboratory scale reactorfor the production of high-purity, isotopically enriched bulksilicon
Technical Report · Sun Dec 19 23:00:00 EST 2004 · OSTI ID:862010

Neutron transmutation doping of polycrystalline silicon
Conference · Wed Mar 31 23:00:00 EST 1976 · OSTI ID:7363810

High purity isotopically enriched [sup 70]Ge and [sup 74]Ge single crystals: Isotope separation, growth, and properties
Journal Article · Tue Jun 01 00:00:00 EDT 1993 · Journal of Materials Research; (United States) · OSTI ID:6457689