Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses. I. Experimental. Part 1
Conference
·
OSTI ID:83791
The authors report extensive laser-induced damage threshold measurements on pure and multilayer dielectrics at 1053 and 526 mm for pulse durations, {tau}, ranging from 140 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated {tau}{sup 1/2} scaling indicate that damage results from plasma formation and ablation for {tau}{le}10 ps and from conventional melting and boiling for {tau}>50 ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with both the pulsewidth and wavelength scaling of experimental results.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 83791
- Report Number(s):
- UCRL-JC--118156-Pt.1; CONF-9410155--5-Pt.1; ON: DE95014537
- Country of Publication:
- United States
- Language:
- English
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