Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses. I. Experimental. Part 1

Conference · Thu Dec 01 00:00:00 EST 1994

OSTI ID:83791

Stuart, B C; Herman, S; Perry, M D

The authors report extensive laser-induced damage threshold measurements on pure and multilayer dielectrics at 1053 and 526 mm for pulse durations, {tau}, ranging from 140 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated {tau}{sup 1/2} scaling indicate that damage results from plasma formation and ablation for {tau}{le}10 ps and from conventional melting and boiling for {tau}>50 ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with both the pulsewidth and wavelength scaling of experimental results.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 83791
• Report Number(s): UCRL-JC-118156-Pt.1; CONF-9410155-5-Pt.1; ON: DE95014537; TRN: 95:017358
• Resource Relation: Conference: 26. annual Boulder damage symposium: laser-induced damage in optical materials, Boulder, CO (United States), 24-26 Oct 1994; Other Information: PBD: Dec 1994
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION
36 MATERIALS SCIENCE
SILICON OXIDES
DAMAGE
CALCIUM FLUORIDES
ANTIREFLECTION COATINGS
REFLECTIVE COATINGS
LASER RADIATION
PULSED IRRADIATION