Silicon Nitride PECVD at Elevated Pressure
Conference
·
OSTI ID:835525
No abstract prepared.
- Research Organization:
- University of California, Los Angeles, CA; Surfx Technologies LLC, Los Angeles, CA (US)
- Sponsoring Organization:
- USDOE Office of Environmental Management (EM); USDOE Office of Science (SC) (US)
- OSTI ID:
- 835525
- Country of Publication:
- United States
- Language:
- English
Similar Records
Silicon Nitride PECVD at Ambient Pressure
Gas-Phase Chemistry of Silicon Nitride PECVD Process at Ambient Pressure
Oxide Coatings on Silicon Nitride by Displacement Reactions
Conference
·
Tue Nov 06 23:00:00 EST 2001
·
OSTI ID:835519
Gas-Phase Chemistry of Silicon Nitride PECVD Process at Ambient Pressure
Conference
·
Thu Nov 07 23:00:00 EST 2002
·
OSTI ID:835522
Oxide Coatings on Silicon Nitride by Displacement Reactions
Conference
·
Mon Mar 05 23:00:00 EST 2001
·
OSTI ID:776208