Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure
Journal Article
·
· Plasma Sources Science and Technology
OSTI ID:835511
No abstract prepared.
- Research Organization:
- University of California, Los Angeles, CA; Surfx Technologies LLC, Los Angeles, CA (US)
- Sponsoring Organization:
- USDOE Office of Environmental Management (EM); USDOE Office of Science (SC) (US)
- OSTI ID:
- 835511
- Journal Information:
- Plasma Sources Science and Technology, Journal Name: Plasma Sources Science and Technology Vol. 13; ISSN 0963-0252
- Publisher:
- Institute of Physics
- Country of Publication:
- United States
- Language:
- English
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